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Our Products
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Continuous APCVD System
A6300
Manufactured by
AMAYA Co., Ltd. |
Continuous APCVD system is traditionally for
semiconductor and solar power cell process. AMAYA Co.,
Ltd provides APCVD System for SiH4 and TEOS Base NSG,
PSG, BPSG film deposition in atmospheric pressure.
Feature
- Use trays to transfer substrates.
- SiC trays achieve lower metal contamination.
- Higher throughput
- Plasma damage free deposition
- Many installation record worldwide
Lineup
- A6300 Small footprint and high
throughput
- AMAX Series Deposit up to 300mm wafers.
- ATO Series Use TEOS for Deposition.
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Single Wafer APCVD System
A200
Manufactured by
AMAYA Co., Ltd.
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AMAYA provides single wafer APCVD system for SiH4 and TEOS
base NSG, PSG, BPSG film deposition.
Feature
- Face down method for better gap fill performance.
- Reduce particles by N2 Purge function.
- Plasma Damage Free design by APCVD system.
Lineup
- A200Series 200mm and 300mm wafer deposition.
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R&D CVD System
Type D301
Manufactured by
AMAYA Co., Ltd. |
R&D CVD System is available by AMAYA Co., Ltd.
Feature
Customize configuration available for R&D and pilot
production.
Lineup
- D301 Single Wafer CVD system for multiple
application.
- D501 Multi Wafer SiH4O3 APCVD System
- D601 Single Wafer APCVD system
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For more information, please
contact us !
Voss electronic GmbH
Poinger Strasse 2·
D-85551 Kirchheim-Heimstetten
Phone +49 (0)89 20 111 77
Fax +49 (0)89 20 128 77
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